Designed for nanotechnologies and labs, the 1st high versatility Plasma Immersion Ion Implant (PIII) tool is now available !
This tool is dedicated to advanced R&D work in nanoelectronics and nanotechnologies.
PULSION Nano makes ultra low energy (ULE) achievable (down to 20eV).
The ability of this bridge tool 200-300 mm to implant smaller substrates (6”, 5” 4” and smaller) combined with its high versatility (broad energy range, broad current scales and gas for different applications) makes PULSION the ideal tool for many applications such as high K, nanocrystals, substrate engineering, solar cells, and more …

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