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PIII implantation PULSION® Family IBS
October 2014

IBS announces a sale of its latest PULSION® HP tool 300mm immersion plasma tool.

The purchase order was from an undisclosed leading semiconductor company in the USA.

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Moreover, IBS confirms the success of PULSION® Nano product line with the delivery of 3 new equipments.

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PULSARCELL (PULSION for High Efficiency Solar Cells) Program
August 2014

"The project allows processes development and design of a new range of high productivity equipment to make silicon solar cells with high yield through the use of plasma immersion technology. This technology will advantageously complement standard technologies of doping on industrial substrates."

This ibs joint research program with INES has shown a yield benefit of 5% on solar cells. Following this significant achievement, ibs strengthens its commitment towards solar applications developments.

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IMC ion implanter release
May 2014

Ibs enlarge its ion implantation offer for SiC applications with the new IMC-200SiC equipment line.
This new equipment is able to achieve a throughput of 25 wph at 600°C for 6" wafer aluminum implantation.

This capability is also available through our new SiC foundry service for 4" and 6" applications.

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Successful Xtensy retrofit for VIIsion implanters
April 2014

The Indirect Heated Cathode sales reach a new milestone with repeat orders in China, Taiwan, USA and Europe.

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