IBS has closed an investment round of 3,500,000 Euro with two financial Institutions to support development and global expansion of the new Pulsion, Plasma Immersion Ion Implanter (PIII).  

Vizille Capital Innovation, BNP Paribas Private Equity and some private investors are supporting the PIII project at IBS. IBS has 21 years of successful experience in Ion Implant, customer support and process innovation. This new funding will accelerate the final phases of development, global marketing and support, and intial production systems of Pulsion.  

IBS is positioned to address 20% of the PIII market by 2014.  

The first Pulsion tool was unveiled in June 2007 and has enjoyed strong interest from the major semiconductor manufacturers. The unique approach to Plasma Implant provides enabling process capability, higher throughput and a lower CoO. Key applications where Pulsion shows enabling capability are 3D structures and Dual Doped Poly.

To read the complete press release (French version only)
For more details about the PIII technology, please contact pulsion@ion-beam-services.fr