Designed for nanotechnologies and labs, the 1st high versatility Plasma Immersion Ion Implant (PIII) tool is now available !
This originally industrial tool is dedicated to advanced R&D works in nanoelectronics and nanotechnologies.
Pulsion Nano makes ultra low energy (ULE) achievable (20V test limited by characterization technique )
The ability of this bridge tool 200-300 mm to implant lower substrates (6”, 5” 4” down to samples) combined with its high versatility (broad energy, current scales and gas for different applications) makes PULSION the ideal tool for many applications such as high K, nanocristals, substrate engineering, solar cells, …

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