From development phase to production: IBS is your partner for your ramping up volumes.
Deposit your thin films with IBS: sputtering, evaporation, PECVD, from small samples to 8" wafers.
IBS offers a broad range of etching technologies: wet, plasma, ion beam, TMAH (Si etching CMOS compatible).
In itself, or combined with deposition/etching steps, you can use our photolithography capacities:
For your annealing or thermal oxidation processes, you can also use IBS: furnace, RTA, laser…

Remember: you can use IBS to prototype and manufacture a full component.

.