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IBS can provide a range of etch processes: wet (resist strip, metals, SiO2 and Si with TMAH), dry (plasma for resist stripping and Si/SiO2/Si3N4), ion beam etch for any material.
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Dry and Wet Etch
Wet bench area and plasma etch can be tailored to your etching solution.
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Silicon Etching: TMAH Solution
IBS offers silicon etch for CMOS with a TMAH solution. This process is used for MEMS applications to release structure.
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